Sputtering Deposition System
by Indian Institute of Technology Roorkee
Published
Mon, 14 Sept
6:30 pm
Bid submission closes
Mon, 5 Oct
3:00 pm· 7 days left
Bid opening
Mon, 5 Oct
3:30 pm
Tender details
- Organisation
- Indian Institute of Technology Roorkee
- Location
- Central Government
- Tender ID
- 2026_IITR_926090_1
- Reference no.
- 2026270301/MM-13/MMED/319
- Category
- Other
- Source portal
- CPPP — Central Public Procurement Portal
How to bid
- 1Open CPPP — Central Public Procurement Portal and search for Tender ID 2026_IITR_926090_1 under Active Tenders (or Tenders by Organisation).
- 2Download the tender documents and any corrigenda. Check eligibility, EMD and the document fee.
- 3Register on the portal as a bidder with a Class 3 Digital Signature Certificate (DSC), then upload your bid before the closing time.
More from Indian Institute of Technology Roorkee
All their tenders →- Workstation
Indian Institute of Technology Roorkee · Central Govt
Mon, 28 Sept11:00 am · 13 min left
- Workstation
Indian Institute of Technology Roorkee · Central Govt
Mon, 28 Sept11:00 am · 13 min left
- Tablet Computer
Indian Institute of Technology Roorkee · Central Govt
Mon, 28 Sept11:00 am · 13 min left
- Tablet Computer
Indian Institute of Technology Roorkee · Central Govt
Mon, 28 Sept11:00 am · 13 min left
- Photocatalytic Reactor with Accessories
Indian Institute of Technology Roorkee · Central Govt
Mon, 28 Sept11:00 am · 13 min left
Similar live tenders
Other in Central Govt →- Sputtering Deposition System
Indian Institute of Technology Roorkee · Central Govt
Mon, 5 Oct3:00 pm · 7 days left
- Turbo vacuum pump to be installed in the existing sputtering system
Kerala University · Kerala
Wed, 7 Oct5:00 pm · 9 days left
- Procurement for Plasma Enhanced Atomic Layer Deposition System (Peald System)
Department of Atomic Energy · Central Govt
Thu, 1 Oct7:00 pm · 3 days left
- Custom Dual-Chamber Thin Film Deposition System
Department of Defence Research and Development · Central Govt
Mon, 5 Oct2:00 pm · 7 days left
- Custom Dual-Chamber Thin Film Deposition System
Department of Defence Research and Development · Central Govt
Mon, 5 Oct2:00 pm · 7 days left
- 3 inch circular 3 inch Iron (Fe) Sputtering Target, 3 inch circular Silicon (Si) Sputtering Target, 3 inch circular Molybdenum Di-Sulphide (MoSi2) Sputtering Target, 3 inch circular Tungsten Di-Silicide (WSi2) Sputtering Target
Department of Atomic Energy · Central Govt
Mon, 5 Oct2:00 pm · 7 days left